InAlAs solar cell on a GaAs substrate employing a graded InxGa1-xAs-InP metamorphic buffer layer

Mathews, Ian; O'Mahony, Donagh; Gocalinska, Agnieszka; Manganaro, M.; Pelucchi, Emanuele; Schmidt, Michael; Morrison, Alan P.; Corbett, Brian
Referencia bibliográfica

Applied Physics Letters, Volume 102, Issue 3, id. 033906 (4 pages) (2013).

Fecha de publicación:
1
2013
Número de autores
8
Número de autores del IAC
0
Número de citas
13
Número de citas referidas
13
Descripción
Single junction In0.52Al0.48As solar cells have been grown on a (100) GaAs substrate by employing a 1 μm thick compositionally graded InxGa1-xAs/InP metamorphic buffer layer to accommodate the 3.9% mismatch. Cells processed from the 0.8 μm thick InAlAs layers had photovoltaic conversion efficiency of 5% with an open circuit voltage of 0.72 V, short-circuit current density of 9.3 mA/cm2, and a fill factor of 74.5% under standard air mass 1.5 illumination. The threading dislocation density was estimated to be 3 × 108 cm-2.