Bibcode
Abundiz, Noemi; Perez, Angeles; García, Víctor; Machorro, Roberto
Referencia bibliográfica
22nd Congress of the International Commission for Optics: Light for the Development of the World. Edited by Rodríguez-Vera, Ramón; Díaz-Uribe, Rufino. Proceedings of the SPIE, Volume 8011, pp. 80112N-80112N-9 (2011).
Advertised on:
8
2011
Número de citas
1
Número de citas referidas
1
Descripción
Line intensity ratio has been used in astronomy to calculate plasma
density and temperature. This procedure is applied to monitor thin film
growth in plasma-assisted deposition, it provides very useful
information such as density and temperature of the plasma. The propose
of this study is monitor variations of the plasma during deposition,
using wide field optical spectroscopy and establish a relation with thin
film stoichiometry. We report the preparation of inhomogeneous SiOxNy
thin films, by sputtering.